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Volumn 55, Issue 22, 2010, Pages 6802-6811

Influence of chloride ion concentration on the electrochemical corrosion behaviour of plasma electrolytic oxidation coated AM50 magnesium alloy

(4) Liang, J a Srinivasan, P Bala a Blawert, C a Dietzel, W a

a INSTITUTE OF MATERIALS RESEARCH (Germany)

Author keywords

Chloride ion concentration; Degradation mechanism; Electrochemical corrosion; Magnesium alloy; Microstructure; Plasma electrolytic oxidation

Indexed keywords

CHLORIDE CONCENTRATIONS; CHLORIDE ION CONCENTRATION; DEGRADATION MECHANISM; ELECTROCHEMICAL DEGRADATION; LOCALIZED DAMAGE; MAGNESIUM SUBSTRATES; MG ALLOY; NACL SOLUTION; PLASMA ELECTROLYTIC OXIDATION; POLARISATION; POTENTIODYNAMICS; PULSED DC POWER SUPPLY;

ALLOYS; CERIUM ALLOYS; CONCENTRATION (PROCESS); CORROSION RESISTANCE; DC POWER TRANSMISSION; DEGRADATION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTROLYSIS; IONS; MAGNESIUM; MAGNESIUM ALLOYS; MAGNETRON SPUTTERING; MICROSTRUCTURE; OPTICAL MICROSCOPY; OXIDATION; PHOSPHATE COATINGS; PLASMAS; SCANNING ELECTRON MICROSCOPY; SILICATES; SODIUM CHLORIDE; SURFACE TESTING;

ELECTROCHEMICAL CORROSION;

EID: 77955717558 PISSN: 00134686 EISSN: None Source Type: Journal
DOI: 10.1016/j.electacta.2010.05.087 Document Type: Article

Times cited : (146)

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