메뉴 건너뛰기




Volumn 12, Issue 6, 2010, Pages 740-744

Effect of parameters of square-wave pulsating current on copper electrodeposition in the hydrogen co-deposition range

Author keywords

Copper; Electrodeposition; Morphology; Pulsating current; Scanning electron microscope (SEM)

Indexed keywords

AVERAGE CURRENTS; CODEPOSITION; COPPER ELECTRODEPOSITION; EFFECT OF PARAMETERS; HYDROGEN EVOLUTION; OVERPOTENTIAL; PULSATING CURRENTS; SCANNING ELECTRON MICROSCOPE (SEM); SCANNING ELECTRON MICROSCOPIC; SQUARE-WAVE; TECHNOLOGICAL SIGNIFICANCE;

EID: 77955716713     PISSN: 13882481     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elecom.2010.03.021     Document Type: Article
Times cited : (31)

References (14)
  • 1
    • 0004195337 scopus 로고
    • McGraw-Hill Book Company New York, St. Louis
    • F.A. Lowenheim Electroplating 1978 McGraw-Hill Book Company New York, St. Louis
    • (1978) Electroplating
    • Lowenheim, F.A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.