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Volumn 12, Issue 6, 2010, Pages 740-744
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Effect of parameters of square-wave pulsating current on copper electrodeposition in the hydrogen co-deposition range
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Author keywords
Copper; Electrodeposition; Morphology; Pulsating current; Scanning electron microscope (SEM)
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Indexed keywords
AVERAGE CURRENTS;
CODEPOSITION;
COPPER ELECTRODEPOSITION;
EFFECT OF PARAMETERS;
HYDROGEN EVOLUTION;
OVERPOTENTIAL;
PULSATING CURRENTS;
SCANNING ELECTRON MICROSCOPE (SEM);
SCANNING ELECTRON MICROSCOPIC;
SQUARE-WAVE;
TECHNOLOGICAL SIGNIFICANCE;
COPPER;
COPPER DEPOSITS;
ELECTRODEPOSITION;
ELECTRON MICROSCOPES;
HYDROGEN;
MORPHOLOGY;
SCANNING;
SCANNING ELECTRON MICROSCOPY;
DEPOSITION;
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EID: 77955716713
PISSN: 13882481
EISSN: None
Source Type: Journal
DOI: 10.1016/j.elecom.2010.03.021 Document Type: Article |
Times cited : (31)
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References (14)
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