Influence of vanadium concentration on the microstructure and magnetic properties of V-doped ZnO thin films

Thin Solid Films

Volumn 518, Issue 19, 2010, Pages 5505-5508

  Naydenova, Ts ^a,e   Atanasov, P ^a   Koleva, M ^a   Nedialkov, N ^a,c   Perriere, J ^b   Defourneau, D ^b   Fukuoka, H ^c   Obara, M ^c   Baumgart, Ch ^d   Zhou, Sh ^d   Schmidt, H ^d  

^a INSTITUTE OF ELECTRONICS   (Bulgaria)

^b INSTITUT DES NANOSCIENCES DE PARIS   (France)

^c KEIO UNIVERSITY   (Japan)

^d INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^e UNIVERSITY OF WÜRZBURG   (Germany)

Author keywords

DMS; PLD; Thin films; Vanadium doping; ZnO

Indexed keywords

DEPOSITED FILMS; DMS; DOPED ZNO; DOPING CONCENTRATION; FERROMAGNETIC BEHAVIORS; FINE-GRAINED MICROSTRUCTURE; GRAIN SIZE; ION CONCENTRATIONS; PLD; PULSED-LASER DEPOSITION TECHNIQUE; SAPPHIRE SUBSTRATES; V-DOPED ZNO; VANADIUM CONCENTRATION; VANADIUM DOPING; ZNO;

CONCENTRATION (PROCESS); DIAMONDS; DOPING (ADDITIVES); MAGNETIC PROPERTIES; METALLIC FILMS; MICROSTRUCTURE; OPTICAL FILMS; PULSED LASER DEPOSITION; PULSED LASERS; SATURATION MAGNETIZATION; THIN FILMS; VANADIUM; VANADIUM ALLOYS; VAPOR DEPOSITION; ZINC; ZINC OXIDE;

CRYSTAL STRUCTURE;

EID: 77955660164     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.04.034     Document Type: Article

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