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Volumn 518, Issue 16, 2010, Pages 4484-4488
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Colloidal lithography and Metal-Organic Chemical Vapor Deposition process integration to fabricate ZnO nanohole arrays
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Author keywords
Catalyst; Colloidal lithography; MOCVD; Nanohole array; Nanowires; ZnO
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Indexed keywords
BOTTOM UP METHODS;
CHEMICAL VAPOUR DEPOSITION;
COLLOIDAL LITHOGRAPHY;
DEPOSITION TEMPERATURES;
METAL-ORGANIC;
METALORGANIC CHEMICAL VAPOR DEPOSITION;
MOCVD;
NANOHOLE ARRAY;
NANOHOLE ARRAYS;
OPTIMAL PROCESS;
PROCESS INTEGRATION;
PROCESS PARAMETERS;
ZNO;
ZNO FILMS;
CATALYSTS;
INDUSTRIAL CHEMICALS;
LITHOGRAPHY;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
NANOWIRES;
OPTIMIZATION;
ORGANIC CHEMICALS;
SILVER;
ZINC OXIDE;
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EID: 77955597336
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2010.04.005 Document Type: Conference Paper |
Times cited : (7)
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References (22)
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