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Volumn 518, Issue 16, 2010, Pages 4484-4488

Colloidal lithography and Metal-Organic Chemical Vapor Deposition process integration to fabricate ZnO nanohole arrays

Author keywords

Catalyst; Colloidal lithography; MOCVD; Nanohole array; Nanowires; ZnO

Indexed keywords

BOTTOM UP METHODS; CHEMICAL VAPOUR DEPOSITION; COLLOIDAL LITHOGRAPHY; DEPOSITION TEMPERATURES; METAL-ORGANIC; METALORGANIC CHEMICAL VAPOR DEPOSITION; MOCVD; NANOHOLE ARRAY; NANOHOLE ARRAYS; OPTIMAL PROCESS; PROCESS INTEGRATION; PROCESS PARAMETERS; ZNO; ZNO FILMS;

EID: 77955597336     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.04.005     Document Type: Conference Paper
Times cited : (7)

References (22)
  • 2
    • 56849132315 scopus 로고    scopus 로고
    • Z.L. Wang ACS Nano 2 10 2008 1987
    • (2008) ACS Nano , vol.2 , Issue.10 , pp. 1987
    • Wang, Z.L.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.