Photolysis of glycolaldehyde in the 280-340 nm region

Journal of Physical Chemistry A

Volumn 114, Issue 32, 2010, Pages 8384-8390

  Zhu, Chengzhu ^b   Zhu, Lei ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b HEFEI UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION CROSS SECTIONS; CAVITY RING-DOWN SPECTROSCOPY; END-PRODUCTS; GASPHASE; GLYCOLALDEHYDES; LASER PHOTOLYSIS; MEASUREMENT UNCERTAINTY; OH RADICAL; PRODUCT CHANNEL; UV PHOTOLYSIS;

ABSORPTION SPECTROSCOPY; FORMIC ACID; FREE RADICALS; GAS ABSORPTION; PHOTOLYSIS; QUANTUM YIELD; RATE CONSTANTS; UNCERTAINTY ANALYSIS;

ALDEHYDES;

ACETALDEHYDE; DRUG DERIVATIVE; GLYCOLALDEHYDE; HYDROXYL RADICAL;

ABSORPTION; ARTICLE; CHEMISTRY; INFRARED SPECTROSCOPY; KINETICS; PHOTOLYSIS;

ABSORPTION; ACETALDEHYDE; HYDROXYL RADICAL; KINETICS; PHOTOLYSIS; SPECTROSCOPY, FOURIER TRANSFORM INFRARED;

EID: 77955592095     PISSN: 10895639     EISSN: 15205215     Source Type: Journal    
DOI: 10.1021/jp104497d     Document Type: Article

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