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Journal of Magnetism and Magnetic Materials

Volumn 322, Issue 21, 2010, Pages 3293-3297

Microstructural and magnetic properties of thick (≥10 μm) magnetron sputtered barium ferrite films

(8) Dehlinger, A S a Le Berre, M a Canut, B a Chatelon, J P b Albertini, D a Perrot, S c Givord, D d Rousseau, J J b

a UNIVERSITÉ DE LYON (France)

b UNIVERSITÉ JEAN MONNET (France)

c Radiall (France)

d LABORATOIRE DE CRISTALLOGRAPHIE (France)

Author keywords

AFM; Barium ferrite; Millimeter wave; RBS; Sputtering; XRD

Indexed keywords

ALUMINA; ALUMINUM OXIDE; ATOMIC FORCE MICROSCOPY; BARIUM; BARIUM COMPOUNDS; DEPOSITION RATES; FERRITE; IRON COMPOUNDS; MAGNETIC PROPERTIES; MAGNETRON SPUTTERING; MICROWAVE DEVICES; MILLIMETER WAVES; RUBIDIUM; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTERING; X RAY DIFFRACTION;

BARIUM FERRITES; COMPOSITIONAL PROPERTIES; DC MAGNETIC PROPERTIES; HIGH DEPOSITION RATES; MAGNETOSTATIC PROPERTIES; REACTIVE RF MAGNETRON SPUTTERING; RUTHERFORD BACKSCATTERING SPECTROMETRY; SPUTTERING GAS PRESSURE;

MAGNETIC THICK FILMS;

EID: 77955574297 PISSN: 03048853 EISSN: None Source Type: Journal
DOI: 10.1016/j.jmmm.2010.06.011 Document Type: Article

Times cited : (11)

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