The resistive-heating characterization of laser heating system and LaB 6 characterization of X-ray diffraction of beamline 12.2.2 at advanced light source

Journal of Physics and Chemistry of Solids

Volumn 71, Issue 8, 2010, Pages 1179-1182

  Yan, Jinyuan ^a,b   Knight, Jason ^a   Kunz, Martin ^a   Vennila Raju, Selva ^a,b   Chen, Bin ^a,b   Gleason, Arianna E ^b   Godwal, Budhiram K ^b   Geballe, Zack ^b   Jeanloz, Raymond ^b   Clark, Simon M ^a,b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED LIGHT SOURCE; BEAM LINES; DIAMOND CELLS; HIGH PRESSURE; LASER HEATING SYSTEM; LAWRENCE BERKELEY NATIONAL LABORATORY; MELTING TEMPERATURES; PARAMETER DETERMINATION; RESISTIVELY HEATED; SAMPLE TEMPERATURE;

HEATING; HIGH PRESSURE ENGINEERING; LASER HEATING; LIGHT SOURCES; PLATINUM; X RAY DIFFRACTION;

SMELTING;

EID: 77955553375     PISSN: 00223697     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jpcs.2010.03.030     Document Type: Conference Paper

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