Wafer-scale fabrication of magneto-photonic structures in Bismuth Iron Garnet thin film

Microelectronic Engineering

Volumn 87, Issue 11, 2010, Pages 2437-2442

  Magdenko, L ^a   Popova, E ^b   Vanwolleghem, M ^a   Pang, C ^a   Fortuna, F ^a   Maroutian, T ^a   Beauvillain, P ^a   Keller, N ^b   Dagens, B ^a  

^a UNIVERSITÉ PARIS SACLAY   (France)

^b LABORATOIRE DES SCIENCES DU CLIMAT ET DE L ENVIRONNEMENT   (France)

Author keywords

2D photonic crystal; BIG; FIB; IBE; ICP; Magnetooptics

Indexed keywords

BISMUTH; BISMUTH COMPOUNDS; FABRICATION; GARNETS; INDUCTIVELY COUPLED PLASMA; ION BEAMS; IONS; IRON; IRON COMPOUNDS; MAGNETOOPTICAL DEVICES; MAGNETOOPTICAL EFFECTS; OPTICAL FILMS; PHOTONIC CRYSTALS; PHOTONIC DEVICES; RIDGE WAVEGUIDES; THIN FILMS; WET ETCHING;

2-D PHOTONIC CRYSTALS; BISMUTH IRON GARNET; FABRICATION TECHNIQUE; FOCUSED ION BEAM ETCHING; INDUCTIVELY COUPLED-PLASMA REACTIVE ION ETCHING; TECHNOLOGICAL PROCESS; TWO-DIMENSIONAL MAGNETO-PHOTONIC CRYSTALS; WAFER SCALE FABRICATION;

REACTIVE ION ETCHING;

EID: 77955509761     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2010.04.021     Document Type: Article

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