Influence of aluminum concentration and substrate temperature on the physical characteristics of chemically sprayed ZnO: Al thin solid films deposited from zinc pentanedionate and aluminum pentanedionate

Materials Science in Semiconductor Processing

Volumn 13, Issue 2, 2010, Pages 80-85

  Castaneda L ^a   Silva Gonzalez R ^a   Gracia Jimenez J M ^a   Hernandez Torres M E ^a   Avendano Alejo M ^b   Márquez Beltrán, César ^a   De La L Olvera, M ^c   Vega Perez J ^c   Maldonado, A ^c  

^a BENEMÉRITA UNIVERSIDAD AUTÓNOMA DE PUEBLA   (Mexico)

^b UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

^c DEPARTAMENTO DE FÍSICA   (Mexico)

Author keywords

Spray pyrolysis; Thin films; Zinc oxide

Indexed keywords

AL CONTENT; ALUMINUM CONCENTRATION; ALUMINUM CONTENTS; ALUMINUM-DOPED ZINC OXIDE; DEPOSITION CONDITIONS; DOPANT CONCENTRATIONS; DOPING CONCENTRATION; FIRST-ORDER RAMAN SCATTERING; PHYSICAL CHARACTERISTICS; POLYCRYSTALLINE; PREFERENTIAL GROWTH; SODA LIME GLASS SUBSTRATE; STARTING SOLUTIONS; SUBSTRATE TEMPERATURE; THIN SOLID FILM; WURTZITE STRUCTURE; ZNO; ZNO:AL FILMS; ZNO:AL THIN FILMS;

ALUMINUM; ALUMINUM COATINGS; AUGER ELECTRON SPECTROSCOPY; CONCENTRATION (PROCESS); CONDUCTIVE FILMS; CRYSTALLITE SIZE; DEPOSITION; OPTIMIZATION; RAMAN SCATTERING; SEMICONDUCTOR DOPING; SPRAY PYROLYSIS; SUBSTRATES; THIN FILMS; TRANSPORT PROPERTIES; VAPOR DEPOSITION; ZINC; ZINC OXIDE; ZINC SULFIDE;

OXIDE FILMS;

EID: 77955472755     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2010.03.003     Document Type: Article

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