-
1
-
-
61649120801
-
-
F.-Q. Xie, R. Maul, A. Augenstein, Ch. Obermair, E.B. Starikov, G. Schön, Th. Schimmel, W. Wenzel, Nano Lett. 8 (12), 4493 (2008).
-
(2008)
Nano Lett.
, vol.8
, Issue.12
, pp. 4493
-
-
Xie, F.-Q.1
Maul, R.2
Augenstein, A.3
Obermair, Ch.4
Starikov, E.B.5
Schön, G.6
Schimmel, Th.7
Wenzel, W.8
-
3
-
-
0032500145
-
-
E. Scheer, N. Agrät, JC. Cuevas, A. Levy Yeyati, B. Ludoph, A. Martin-Rodero, G. Rubio Bollinger, J. M. van Ruitenbeek, and C. Urbina, Nature 394, 154 (1998).
-
(1998)
Nature
, vol.394
, pp. 154
-
-
Scheer, E.1
Agrät, N.2
Cuevas, J.C.3
Levy Yeyati, A.4
Ludoph, B.5
Martin-Rodero, A.6
Rubio Bollinger, G.7
Van Ruitenbeek, J.M.8
Urbina, C.9
-
5
-
-
0000934959
-
-
C. Z. Li, A. Bogozi, W. Huang, N. J. Tao, Nanotechnology 10, 221 (1999).
-
(1999)
Nanotechnology
, vol.10
, pp. 221
-
-
Li, C.Z.1
Bogozi, A.2
Huang, W.3
Tao, N.J.4
-
6
-
-
19644383317
-
-
F.-Q. Xie, L. Nittler, Ch. Obermair, Th. Schimmel, Phys. Rev. Lett. 93, 128303 (2004).
-
(2004)
Phys. Rev. Lett.
, vol.93
, pp. 128303
-
-
Xie, F.-Q.1
Nittler, L.2
Obermair, Ch.3
Schimmel, Th.4
-
9
-
-
11944255355
-
-
K. Terabe, T. Hasegawa, T. Nakayama, and M. Aono, Nature 433, 47 (2005).
-
(2005)
Nature
, vol.433
, pp. 47
-
-
Terabe, K.1
Hasegawa, T.2
Nakayama, T.3
Aono, M.4
-
10
-
-
49149085339
-
-
F.-Q. Xie, R. Maul, S. Brendelberger, Ch. Obermair, E. Starikow, W. Wenzel, G. Schön, Th. Schimmel, Appl. Phys. Lett. 93, 043103 (2008).
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 043103
-
-
Xie, F.-Q.1
Maul, R.2
Brendelberger, S.3
Obermair, Ch.4
Starikow, E.5
Wenzel, W.6
Schön, G.7
Schimmel, Th.8
-
11
-
-
77955448655
-
-
R. Gross et al. (eds.), Springer
-
F.-Q. Xie, Ch. Obermair and Th. Schimmel, in: R. Gross et al. (eds.), Nanoscale Devices - Fundamentals and Applications. Springer, 153-162, 2006.
-
(2006)
Nanoscale Devices - Fundamentals and Applications
, pp. 153-162
-
-
Xie, F.-Q.1
Obermair, Ch.2
Schimmel, Th.3
-
13
-
-
77952834520
-
-
F.-Q. Xie, R. Maul, Ch. Obermair, G. Schön, W. Wenzel, Th. Schimmel, Advanced Materials 22, 2033 (2010).
-
(2010)
Advanced Materials
, vol.22
, pp. 2033
-
-
Xie, F.-Q.1
Maul, R.2
Obermair, Ch.3
Schön, G.4
Wenzel, W.5
Schimmel, Th.6
-
14
-
-
77955445398
-
-
Patent pending US 2009195300. 29, or http://dx.doi.org/10.1051/epn/ 2010404
-
Th. Schimmel, F.-Q. Xie, Ch. Obermair, Patent pending, US 2009195300. 29 http://www.europhysicsnews.org or http://dx.doi.org/10.1051/epn/2010404
-
-
-
Schimmel, Th.1
Xie, F.-Q.2
Obermair, Ch.3
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