One-step fabrication of high quality double-walled carbon nanotube thin films by a chemical vapor deposition process

Carbon

Volumn 48, Issue 13, 2010, Pages 3817-3824

  Feng, Jian Min ^a   Wang, Rui ^a   Li, Ya Li ^a   Zhong, Xiao Hua ^a   Cui, Lan ^b   Guo, Qian Jin ^b   Hou, Feng ^a  

^a BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

^b TIANJIN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

A-CARBON; ARGON ENVIRONMENT; ARGON FLOW; CATALYTIC CHEMICAL VAPOR DEPOSITION; CHEMICAL VAPOR DEPOSITION PROCESS; DOUBLE-WALLED CARBON NANOTUBES; ELECTRICALLY CONDUCTIVE; FABRICATION PROCESS; FUNCTIONAL APPLICATIONS; GAS FLOWS; GAS RATES; HIGH QUALITY; LARGE-SCALE PRODUCTION; LOW-INTENSITY; MACROSCOPIC SCALE; PROPERTY MEASUREMENT; SPECTRAL ANALYSIS; SYNTHESIS REACTION; SYNTHESIS TEMPERATURES;

ACETONE; ARGON; CARBON FILMS; CARBON NANOTUBES; CHEMICAL VAPOR DEPOSITION; DEPOSITION; ELECTRIC PROPERTIES; FABRICATION; FLOW OF GASES; MULTIWALLED CARBON NANOTUBES (MWCN); REACTION RATES; SPECTRUM ANALYSIS; SPECTRUM ANALYZERS; SYNTHESIS (CHEMICAL);

QUALITY CONTROL;

EID: 77955419541     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2010.06.046     Document Type: Article

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