Nano-photomask fabrication using focused ion beam direct writing

CIRP Annals - Manufacturing Technology

Volumn 59, Issue 1, 2010, Pages 543-546

  Fang, F Z ^a,b   Xu, Z W ^a,b   Hu, X T ^a   Wang, C T ^c   Luo, X G ^c   Fu, Y Q ^d  

^a TIANJIN UNIVERSITY   (China)

^b Tianjin MicroNano Manufacturing Tech Co Ltd   (China)

^c INSTITUTE OF OPTICS AND ELECTRONICS   (China)

^d UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

Ion beam machining (IBM); Nano manufacturing; Photomask

Indexed keywords

ASTIGMATION; BIT MAPS; DIRECT WRITING; DOT ARRAY; DWELL TIME; EFFECTIVE PARAMETERS; FABRICATION PROCESS; ION BEAM MACHINING; NANO SCALE; NANO-MANUFACTURING; NOVEL METHODS; PHOTOMASK FABRICATION; REMOVAL MECHANISM;

FABRICATION; FOCUSED ION BEAMS; ION BOMBARDMENT; IONS; MACHINING; PHOTOMASKS;

BEAM PLASMA INTERACTIONS;

EID: 77955316021     PISSN: 00078506     EISSN: 17260604     Source Type: Journal    
DOI: 10.1016/j.cirp.2010.03.038     Document Type: Article

References (10)

1. Syed Rizvi Handbook of Photomask Manufacturing Technology 2005 Taylor & Francis Group
2. K. Venkatakrishnan, B.K.A. Ngoi, P. Stanley, L.E.N. Lim, B. Tan, and N.R. Sivakumar Laser Writing Techniques for Photomask Fabrication Using a Femtosecond Laser Applied Physics A - Materials Science & Processing 74/4 2002 493 496
3. D.M. Allen, P. Shore, R.W. Evans, C. Fanara, W.O'. Brien, S. Marson, and W.O'. Neill Ion Beam, Focused Ion Beam, and Plasma Discharge Machining Annals of the CIRP 58/2 2009 647 662
4. A.A. Tseng Recent Developments in Nanofabrication Using Focused Ion Beams Small 1/10 2005 924 939
5. A.A.G. Bruzzone, H.L. Costa, P.M. Lonardo, and D.A. Lucca Advances in Engineered Surfaces for Functional Performance Annals of the CIRP 57/2 2008 750 769
6. K.K.B. Hon, L. Li, and I.M. Hutchings Direct Writing Technology - Advances and Developments Annals of the CIRP 57/2 2008 601 620
7. W.C.-L. Hopman, F. Ay, W.B. Hu, V.J. Gadgi, L. Kuipers, M. Pollnau, and R.M.-D. Ridder Focused Ion Beam Scan Routine, Dwell Time and Dose Optimizations for Submicrometre Period Planar Photonic Crystal Components and Stamps in Silicon Nanotechnology 18 195305 2007 11
8. F.Z. Fang, Z.W. Xu, G.X. Zhang, and X.T. Hu Fabrication and Configuration of Carbon Nanotube Probes in Atomic Force Microscopy Annals of the CIRP 58/1 2009 455 458
9. A.A. Tseng Recent Developments in Micromilling Using Focused Ion Beam Technology Journal of Micromechanics and Microengineering 14 2004 R15 R34
10. Y.Q. Fu, and N.K.A. Bryan Influence of Astigmatism on the Fabrication of Diffractive Structures by use of Focused Ion Beam Milling Optics Express 12/17 2004 3954 3966