Surface characterization and growth mechanism of laminated Ti 3 SiC 2 crystals fabricated by hot isostatic pressing

Applied Surface Science

Volumn 256, Issue 23, 2010, Pages 6986-6990

  Wu, Qiong ^a   Li, Changsheng ^a   Tang, Hua ^a  

^a JIANGSU UNIVERSITY   (China)

Author keywords

Growth mechanism; Hot isostatic pressing

Indexed keywords

ALUMINUM ALLOYS; CRYSTAL MICROSTRUCTURE; ELECTRON DIFFRACTION; LAMINATING; NUCLEATION; SILICON COMPOUNDS; SINTERING; SODIUM CHLORIDE; TITANIUM COMPOUNDS;

ELECTRONIC MICROSCOPES; GROWTH MECHANISMS; GROWTH PATTERNS; HIGH RESOLUTION; LATERAL SPREADING; SELECTED AREA ELECTRON DIFFRACTION; SURFACE CHARACTERIZATION; TWO-DIMENSIONAL NUCLEATION;

HOT ISOSTATIC PRESSING;

EID: 77955309967     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.05.012     Document Type: Article

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