Effect of high magnetic field annealing on the microstructure and magnetic properties of CoFe layered double hydroxide

Journal of Magnetism and Magnetic Materials

Volumn 322, Issue 20, 2010, Pages 3023-3027

  Zhang, Xiong ^a   Wang, Dongliang ^a   Zhang, Shuxia ^a   Ma, Yanwei ^a   Yang, Wensheng ^b   Wang, Yi ^b   Awaji, Satoshi ^c   Watanabe, Kazuo ^c  

^a INSTITUTE OF ELECTRICAL ENGINEERING   (China)

^b BEIJING UNIVERSITY OF CHEMICAL TECHNOLOGY   (China)

^c TOHOKU UNIVERSITY   (Japan)

Author keywords

CoFe layered double hydroxide; CoFe2O4; Magnetic field annealing; Magnetic property

Indexed keywords

COFE2O4; GRAIN SIZE; HIGH MAGNETIC FIELDS; LAYERED DOUBLE HYDROXIDES; LOW TEMPERATURES; MAGNETIC FIELD ANNEALING; POROUS PLATE; XRD; ZERO MAGNETIC FIELDS;

ANNEALING; CALCINATION; MAGNETIC MATERIALS; MAGNETIC PROPERTIES; MICROSTRUCTURE; NANOMAGNETICS; POROUS PLATES; SATURATION MAGNETIZATION;

MAGNETIC FIELD EFFECTS;

EID: 77955307760     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2010.05.023     Document Type: Article

References (20)

1. D.G. Evans, and X. Duan Chem. Commun. 2006 485
2. W.Q. Meng, F. Li, D.G. Evans, and X. Duan Mater. Chem. Phys. 86 2004 1
3. H.S. Panda, R. Srivastava, and D. Bahadur J. Phys. Chem. C 113 2009 9560
4. S. Asai, K.-S. Sassa, and M. Tahashi Sci. Tech. Adv. Mater. 4 2003 455
5. H.Y. Wang, X.K. Ma, Y.J. He, S. Mitani, and M. Motokawa Appl. Phys. Lett. 85 2004 2304
6. Y.W. Ma, L.Y. Xiao, and L.G. Yan Chin. Sci. Bull. 51 2006 2944
7. Y.W. Ma, A.X. Xu, X.H. Li, X.P. Zhang, M. Guilloux-Viry, O. Pena, S. Awaji, and K. Watanabe Appl. Phys. Lett. 89 2006 152505
8. Y.W. Ma, S. Awaji, K. Watanabe, M. Matsumoto, and N. Kobayashi Appl. Phys. Lett. 76 2000 37
9. T. Kimura, H. Ago, M. Tobita, S. Ohshima, M. Kyotani, and M. Yumura Adv. Mater. 14 2002 1380
10. W.J. Luo, D.L. Wang, F.W. Wang, T. Liu, J.W. Cai, L.Y. Zhang, and Y.L. Liu Appl. Phys. Lett. 94 2009
11. J.H. Wang, Y.W. Ma, and K. Watanabe Chem. Mater. 20 2008 20
12. A. Nakahira, H. Murase, and H. Yasuda J. Appl. Phys. 101 2007
13. H. Murase, H. Yasuda, and A. Nakahira Mater. Trans. 48 2007 2877
14. Y. Zhao, F. Li, R. Zhang, D.G. Evans, and X. Duan Chem. Mater. 14 2002 4286
15. J.H. Wang, L. Wang, P. Yu, D.L. Wang, Y.W. Ma, and K. Watanabe J. Magn. Magn. Mater. 321 2009 3411
16. M. del Arco, R. Trujillano, and V. Rives J. Mater. Chem. 8 1998 761
17. V. Rives Mater. Chem. Phys. 75 2002 19
18. W.T. Reichle, S.Y. Kang, and D.S. Everhardt J. Catal. 101 1986 352
19. S.A. Makhlouf J. Magn. Magn. Mater. 246 2002 184
20. R.S. Turtelli, G.V. Duong, W. Nunes, R. Grossinger, and M. Knobel J. Magn. Magn. Mater. 320 2008 E339