Effect of sputtering parameters and sample size on giant magnetoimpedance effect in NiFe and NiFe/Cu/NiFe films

Materials Science and Engineering: B

Volumn 172, Issue 2, 2010, Pages 101-107

  Chen, Lei ^a   Zhou, Yong ^a   Lei, Chong ^a   Zhou, Zhi Min ^a  

^a BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

Author keywords

Giant magnetoimpedance; NiFe thin film; Sample size; Sputtering parameters

Indexed keywords

BINARY ALLOYS; COPPER; ELECTRIC IMPEDANCE; SPUTTERING; THIN FILMS;

GIANT MAGNETO IMPEDANCE EFFECT; GIANT MAGNETO-IMPEDANCE; LAYER WIDTH; MAGNETOIMPEDANCE RATIOS; NIFE THIN FILMS; NIFE/CU/NIFE FILM; SAMPLE SIZES; SANDWICH FILMS; SPUTTERING PARAMETERS; THIN-FILMS;

IRON ALLOYS;

EID: 77955303626     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2010.04.026     Document Type: Article

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