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Volumn 81, Issue 12, 2010, Pages
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Erratum: Ab initio study of subsurface diffusion of Cu on the H-passivated Si(001) surface (Physical Review B (2009) 80 (155426)
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Author keywords
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Indexed keywords
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EID: 77955201239
PISSN: 10980121
EISSN: 1550235X
Source Type: Journal
DOI: 10.1103/PhysRevB.81.129902 Document Type: Article |
Times cited : (2)
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References (0)
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