Photodegradation of bisphenol AF in montmorillonite dispersions: Kinetics and mechanism study

Applied Clay Science

Volumn 49, Issue 3, 2010, Pages 182-186

  Liu, Yanxiang ^a   Zhang, Xu ^b   Wu, Feng ^b  

^a JIANGHAN UNIVERSITY   (China)

^b WUHAN UNIVERSITY   (China)

Author keywords

Bisphenol; Fenton reaction; Montmorillonite; Photodegradation

Indexed keywords

BISPHENOLS; CONCENTRATION OF; DEGRADATION MECHANISM; FENTON REACTION; FENTON REACTIONS; FLUORINE CONCENTRATIONS; HYDROXYL RADICALS; INITIAL CONCENTRATION; INITIAL PH; KINETICS AND MECHANISM; LANGMUIR-HINSHELWOOD KINETICS; MONTMORILLONITE KSF; RATE MODELS; REACTIVE SPECIES;

CLAY MINERALS; CONCENTRATION (PROCESS); DISPERSIONS; FLUORINE; PHENOLS; RATE CONSTANTS; REACTION KINETICS; SILICATE MINERALS;

DEGRADATION;

CONCENTRATION (COMPOSITION); DECOMPOSITION; FLUORINE; HYDROXYL RADICAL; IRRADIATION; MONTMORILLONITE; PHOTODEGRADATION; REACTION KINETICS; REACTION RATE;

EID: 77955056600     PISSN: 01691317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.clay.2010.05.002     Document Type: Article

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