Structurally-tolerant vertical directional coupling between metal-insulator-metal plasmonic waveguide and silicon dielectric waveguide

Optics Express

Volumn 18, Issue 15, 2010, Pages 15531-15543

  Li, Qiang ^a   Qiu, Min ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

BANDPASS FILTERS; DIELECTRIC WAVEGUIDES; ELECTRIC CONNECTORS; INSERTION LOSSES; LIGHT EXTINCTION; METAL INSULATOR BOUNDARIES; METALS; PLASMONS; SEMICONDUCTOR INSULATOR BOUNDARIES; WAVEGUIDE COUPLERS;

COUPLING EFFICIENCY; COUPLING LENGTH; DIRECTIONAL COUPLING; EXTINCTION RATIOS; HYBRID COUPLER; MAXIMUM EXTINCTION RATIOS; METAL INSULATOR METALS; PHOTONIC INTEGRATED CIRCUITS; PLASMONIC WAVEGUIDES; POLARIZATION CONTROL; SIGNAL ROUTING; STRUCTURAL PARAMETER; TE AND TM MODES;

MIM DEVICES;

EID: 77954950466     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.015531     Document Type: Article

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