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Applied Physics A: Materials Science and Processing

Volumn 99, Issue 4, 2010, Pages 745-749

Microstructure control of low-resistivity tin-doped indium oxide films grown by photoreaction of nanoparticles using a KrF excimer laser at room temperature

(5) Tsuchiya, T a Yamaguchi, F b Morimoto, I b Nakajima, T a Kumagai, T a

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

b ASAHI KASEI CORPORATION (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COATED NANOPARTICLES; ELECTRICAL RESISTIVITY; EXCIMER LAMPS; HALL MEASUREMENTS; ITO FILMS; KRF EXCIMER LASER; MICROSTRUCTURE CONTROL; PHOTO-IRRADIATION; PHOTOREACTIONS; ROOM TEMPERATURE; THERMAL PROCESS; TIN DOPED INDIUM OXIDE; TWO-STEP PROCESS; XE EXCIMER LAMP;

ATOMIC FORCE MICROSCOPY; CARRIER CONCENTRATION; CARRIER MOBILITY; ELECTRIC CONDUCTIVITY; EXCIMER LASERS; FILM PREPARATION; GAS LASERS; INDIUM; INDIUM COMPOUNDS; IRRADIATION; KRYPTON; MICROSTRUCTURE; NANOPARTICLES; OXIDE FILMS; SILICON COMPOUNDS; SINTERING; TIN; TITANIUM COMPOUNDS; XENON;

ITO GLASS;

EID: 77954888441 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-010-5633-0 Document Type: Article

Times cited : (26)

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