9.2: Fabrication techniques for a THz EIK

2010 IEEE International Vacuum Electronics Conference, IVEC 2010

Volumn , Issue , 2010, Pages 181-182

  Dobbs, Richard ^a   Roitman, Albert ^a   Horoyski, Peter ^a   Hyttinen, Mark ^a   Sweeney, Dan ^a   Chernin, David ^b   Blank, Monica ^c   Barker, N Scott ^d   Booske, John ^e   Wright, Edward ^f   Calame, Jeffrey ^g   Makarova, Olga V ^h  

^a Millimeter Wave Products   (Canada)

^b Science Applications   (United States)

^c Communications and Power Industries ^*  (United States)

^d UNIVERSITY OF VIRGINIA   (United States)

^e UNIVERSITY OF WISCONSIN MADISON   (United States)

^f BEAM WAVE RESEARCH INC   (United States)

^g NAVAL RESEARCH LABORATORY   (United States)

^h CREATV MICROTECH INC   (United States)

Author keywords

EDM; EIK; Micromachining; THz; UV lithography; X ray lithography

Indexed keywords

FABRICATION TECHNIQUE; THZ FREQUENCIES; UV LITHOGRAPHY;

COMPOSITE MICROMECHANICS; FABRICATION; LITHOGRAPHY; VACUUM; VACUUM TECHNOLOGY; X RAY LITHOGRAPHY;

MICROMACHINING;

EID: 77954854093     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IVELEC.2010.5503544     Document Type: Conference Paper

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