Sputter deposition of strain gauges using ITO/Ag

Plasma Processes and Polymers

Volumn 6, Issue SUPPL. 1, 2009, Pages

  Gerdes, Holger ^a   Bandorf, Ralf ^a   Heckmann, Ulrike ^a   Schmidt, Volker ^a   Kricheldorf, Hans Ulrich ^a   Bräuer, Günter ^a  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

Author keywords

Gauge factor; Indium tin oxide; ITO; Strain gauge; TCR; Thin film

Indexed keywords

APPLIED FORCES; GAUGE FACTORS; INDIUM TIN OXIDE; INFLUENCE OF HUMIDITY; ITO; ITO FILMS; POLYMER SUBSTRATE; PROMISING MATERIALS; SENSOR MATERIALS; SILVER CONTENT; STRAIN GAUGE; TEMPERATURE COEFFICIENT OF RESISTANCE; THIN FILM STRAIN GAUGE; WORK PIECES; ZERO-CROSSINGS;

ELECTRIC RESISTANCE; INDIUM; INDUSTRIAL APPLICATIONS; ITO GLASS; PHOTOLITHOGRAPHY; POLYIMIDES; SHEET RESISTANCE; STRAIN GAGES; THIN FILMS; TIN; TITANIUM COMPOUNDS; VAPOR DEPOSITION;

SILVER;

EID: 77954845413     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200932101     Document Type: Conference Paper

References (4)

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2. O. J. Gregory, Q. Luo, E. Crisman, Thin Solid Films 2002, 406, 286-293.
3. S. E. Dyer, O. J. Gregory, P. S. Amons, A. Bruins Slot, Thin Solid Films 1996, 288, 249-286.
4. G. R. Witt, Thin Solid Films 1974, 22, 133-156.