Photocatalytic cleavage of self-Assembled organic monolayers by UV-lnduced charge transfer from CaN Substrates

Advanced Materials

Volumn 22, Issue 24, 2010, Pages 2632-2636

  Howgate, John ^b   Schoell, Sebastian J ^b   Hoeb, Marco ^b   Steins, Wiebke ^b   Baur, Barbara ^b   Henrich, Samira ^c   Nickel, Bert ^c   Sharp, Ian D ^b   Stutzmann, Martin ^b   Eickhoff, Martin ^a  

^a JUSTUS LIEBIG UNIVERSITY   (Germany)

^b WALTER SCHOTTKY INSTITUT   (Germany)

^c UNIVERSITY OF MUNICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALIPHATIC CHAINS; MOLECULAR MONOLAYER; PHOTO-CATALYTIC; SELF-ASSEMBLED ORGANIC MONOLAYERS; SEMI-CONDUCTOR SURFACES;

ALIGNMENT; CHARGE TRANSFER; GALLIUM NITRIDE; ION EXCHANGE; MASS TRANSFER; SILICON CARBIDE;

SELF ASSEMBLED MONOLAYERS;

GALLIUM; GALLIUM NITRIDE; HYDROXIDE; HYDROXIDE ION; INORGANIC COMPOUND; N OCTADECYLTRIMETHOXYSILANE; N-OCTADECYLTRIMETHOXYSILANE; ORGANOSILICON DERIVATIVE; SILICON CARBIDE; SILICON DERIVATIVE;

ARTICLE; CATALYSIS; CHEMISTRY; ELECTRON TRANSPORT; RADIATION EXPOSURE; SPECTROSCOPY; ULTRAVIOLET RADIATION;

CARBON COMPOUNDS, INORGANIC; CATALYSIS; ELECTRON TRANSPORT; GALLIUM; HYDROXIDES; ORGANOSILICON COMPOUNDS; SILICON COMPOUNDS; SPECTRUM ANALYSIS; ULTRAVIOLET RAYS;

EID: 77954843479     PISSN: 09359648     EISSN: 15214095     Source Type: Journal    
DOI: 10.1002/adma.200903756     Document Type: Article

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