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Volumn , Issue , 2010, Pages 217-218
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12.3: Extended interaction klystrons for terahertz power amplifiers
a
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Author keywords
Extended interaction klystron; Lithography; Terahertz; Tolerances; Vacuum electronics
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Indexed keywords
EXTENDED INTERACTION KLYSTRON;
EXTENDED INTERACTION KLYSTRONS;
MEASUREMENT TECHNOLOGIES;
OUTPUT POWER;
TERA HERTZ;
VACUUM ELECTRONICS;
MICROWAVE TUBES;
PARAMAGNETIC RESONANCE;
POWER AMPLIFIERS;
VACUUM;
VACUUM TECHNOLOGY;
KLYSTRONS;
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EID: 77954838595
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/IVELEC.2010.5503526 Document Type: Conference Paper |
Times cited : (35)
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References (6)
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