Orthogonal functionalization of silicon substrates using self-assembled monolayers

Langmuir

Volumn 26, Issue 11, 2010, Pages 8358-8365

  Herzer, Nicole ^a   Haensch, Claudia ^a   Hoeppener, Stephanie ^b   Schubert, Ulrich S ^a,b  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AU NANOPARTICLE; COMPLEX SURFACE; FABRICATION PROCESS; FUNCTIONAL MOIETIES; FUNCTIONALIZATIONS; FUNCTIONALIZED; FUNCTIONALIZED MICELLES; LOCAL DEPOSITION; NANO-MATERIALS; SI NANOPARTICLES; SILICON SUBSTRATES; STRUCTURED SURFACES; SURFACE MODIFICATION; SURFACE-SENSITIVE TECHNIQUE; UV-OZONE;

CARBOXYLIC ACIDS; GOLD; NANOPARTICLES; ORGANIC ACIDS; OZONE; SUBSTRATES;

SELF ASSEMBLED MONOLAYERS;

OZONE; SILICON;

ARTICLE; CHEMISTRY; ELECTROCHEMISTRY; OXIDATION REDUCTION REACTION; SURFACE PROPERTY; ULTRAVIOLET RADIATION;

ELECTROCHEMISTRY; OXIDATION-REDUCTION; OZONE; SILICON; SURFACE PROPERTIES; ULTRAVIOLET RAYS;

EID: 77954562579     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la9047837     Document Type: Article

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