Molecular conformation-controlled vesicle/micelle transition of cationic trimeric surfactants in aqueous solution

Langmuir

Volumn 26, Issue 11, 2010, Pages 7922-7927

  Wu, Chunxian ^a   Hou, Yanbo ^a   Deng, Manli ^a   Huang, Xu ^a   Yu, Deferas ^a   Xiang, Junfeng ^b   Liu, Yu ^c   Li, Zhibo ^c   Wang, Yilin ^a  

^a PEKING UNIVERSITY   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

^c INSTITUTE OF CHEMISTRY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AGGREGATION BEHAVIOR; AMIDE GROUPS; AQUEOUS SOLUTIONS; CRITICAL AGGREGATION CONCENTRATION; CRYOGENIC TRANSMISSION ELECTRON MICROSCOPY; ELECTRICAL CONDUCTIVITY; ELECTROSTATIC REPULSION; HYDROPHOBIC CHAINS; HYDROPHOBIC INTERACTIONS; HYDROPHOBIC TAILS; ISOTHERMAL TITRATION MICROCALORIMETRY; MOLECULAR CONFORMATION; NMR TECHNIQUES; STAR-LIKE; SURFACTANT CONCENTRATIONS; SURFACTANT MOLECULES; TRANSITION PROCESS;

AGGLOMERATION; AMIDES; CONFORMATIONS; DYES; ELECTRIC CONDUCTIVITY; HYDROPHOBICITY; LIGHT TRANSMISSION; MICELLES; SCANNING ELECTRON MICROSCOPY; SURFACE TENSION; TRANSMISSION ELECTRON MICROSCOPY;

CATIONIC SURFACTANTS;

EID: 77954558079     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la9048067     Document Type: Article

References (36)

1. Bunton. C. A.; Robinson, L.; Schaak, J.; Stam, M. F. J. Org. Chem. 1971, 36, 2346-2350.
2. Menger, F. M.; Keiper, J. S. Angew. Chem., Int. Ed. 2000, 39, 1906-1920.
3. Zana, R. Adv. Colloid Interface Sci. 2002, 97, 205-253.
4. Gemini Surfactants: Synthesis, Interfacial and Solution-Phase Behavior, and Applications; Zana, R., Xia, I., Eds.; Marcel Dekker: New York, 2004.
5. Minami, H.; Inoue, T. Langmuir 1999, 15, 6643-6651.
6. Yin, H.; Huang, J.; Gao, Y.; Fu, H. Langmuir 2005, 21, 2656-2659.
7. You, H.; Tirrell, D. A. J. Am. Chem. Soc. 1991, 113, 4022-4023.
8. Huang, X.; Cao, M.; Wang, J.; Wang, Y. J. Phys. Chem, B 2006, 110, 19479-19486.
9. Laschewsky, A. Adv. Polym. Sci. 1995, 124, 1-86.
10. Daninod, D.; Talmon, Y.; Levy, H.; Beinert, G.; Zana, R. Science 1995, 269, 1420-1421.
11. Zana, R.; Levy, H.; Papoutsi, D.; Beinert, G. Langmuir 1995, 11, 3694-3698.
12. Menger, F. M.; Migulin, V. A. J. Org. Chem. 1999, 64, 8916-8921.
13. Esumi, K.; Taguma, K.; Koide, Y. Langmuir 1996, 12, 4039-4041.
14. Sumida, Y.; Masuyama, A.; Maekawa, H.; Takasu, M.; Rida, T.; Nakatsuji, Y.; Ikeda, I.; Nojima, M. Chem. Commun. 1998, 2385-2386.
15. Yoshimura, T.; Esumi, K. Langmuir 2003, 19, 3535-3538.
16. Yoshimura, T.; Yoshida, H.; Ohno, A.; Esumi, K. J. Colloid Interface Sci. 2003, 267, 167-172.
17. Yoshimura, T.; Kimura, N.; Onitsuka, E.; Shosenji, H.; Esumi, K. J. Surfactants Deterg. 2004, 7, 67-74.
18. Gao, C. L.; Millqvist-Fureby, A.; Whitcombe, M. J.; Vulfson, E. N. J. Surfactants Deterg. 1999, 2, 293-302.
19. Murgula, M. C.; Cabrera, M. I.; Guastavino, J. E.; Grau, R. J. Colloids Surf., A 2005, 262, 1-7.
20. Murguia, M. C.; Cristaldi, M. D.; Porto, A.; Di Conza, J.; Grau, R. J. J. Surfactants Deterg. 2008, 11, 41-48.
21. In, M.; Bec, V.; Aguerre-Chariol, O.; Zana, R. Langmuir 2000, 16, 141-148.
22. Hou, Y.; Cao, M.; Deng, M.; Wang, Y. Langmuir 2008, 24, 10572-10574.
23. Rosen, M.; Tracy, D. J. Surfactants Deterg. 1998, 1, 547-554.
24. Bellare, J. R.; Davis, H. T.; Scriven, L. E.; Talmon, Y. J. Electron. Microsc. Tech. 1988, 10, 87-111.
25. Johson, I.; Olofsson, G.; Jönsson, B. J. Chem. Soc., Faraday Trans. 1 1987, 83, 3331-3344.
26. Király, Z.; Dekány, I. J. Colloid Interface Sci. 2001, 242, 214-219.
27. Bhattacharya, S.; Haldar, J. Langmuir 2004, 20, 7940-7947.
28. Li, Y.; Reeve, J.; Wang, Y.; Thomas, R. K.; Wang, J.; Yan, H. J. Phys. Chem. 5 2005, 109, 16070-16074.
29. Dorshow, R.; Briggs, J.; Bunton, C. A.; Nicoli, D. F. J. Phys. Chem. 1982, 86, 2388-2395.
30. Dorshow, R. B.; Bunton, C. A.; Nicoli, D. F. J. Phys. Chem. 1983, 87, 1409-1416.
31. Biresaw, G.; McKenzie, D. C.; Bunton, C. A.; Nicoli, D. F. J. Phys. Chem. 1985, 89, 5144-5146.
32. Villeneuve, M.; Ootsu, R.; Ishiwata, M.; Nakahara, H. J. Phys. Chem. B 2006, 110, 17830-17839.
33. Jiang, Y.; Chen, H.; Cui, X.; Mao, S.; Liu, M.; Luo, P.; Du, Y. Langmuir 2008, 24, 3118-3121.
34. Wennerström, H.; Lindman, B.; Söederman, O.; Drakenberg, T.; Rosenholm, J. B. J. Am. Chem. Soc. 1979, 101, 6860-6864.
35. Halle, B.; Wennerström, H. J. Chem. Phys. 1981, 75, 1928-1943.
36. Hou, Y.; Han, Y.; Deng, M.; Xiang, J.; Wang, Y. Langmuir 2009, 26, 28-33.