Metal thin-film nanophases and their interface with silicon

Journal of Physics: Conference Series

Volumn 100, Issue PART 5, 2008, Pages

  Plusnin, N I ^a,b   Il'iashchenko, V M ^a   Kitan, S A ^a   Krylov, S V ^a  

^a INSTITUTE OF AUTOMATION AND CONTROL PROCESSES   (Russian Federation)

^b VLADIVOSTOK STATE UNIVERSITY OF ECONOMICS AND SERVICE   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

AUGERS; COBALT; DEPOSITION; ELECTRON ENERGY LOSS SPECTROSCOPY; INTERFACE STATES; INTERFACES (MATERIALS); SILICON;

CONDUCTIVITY MEASUREMENTS; GROWTH MECHANISMS; INTERFACE LAYER; LAYER-BY-LAYER GROWTH; METAL THIN FILM; SI(100) SURFACE; SUBMONOLAYER COVERAGE; VALENCE ELECTRON;

THIN FILMS;

EID: 77954328594     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/100/5/052094     Document Type: Conference Paper

References (5)

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3. Plusnin N I, Iliyashenko V M and Milenin A P 2002 Phys. Low-Dim. Str. No 11/12 39
4. Plusnin N I, Il'yashenko V M, Kitan' S A, Krylov S V 2007 Appl. Surf. Sci. 253 7225
5. Plyusnin N I, Il'yashchenko V M, Krylov S V, Kitan' S A 2007 Technical Physics Letters 33 486