메뉴 건너뛰기




Volumn 1109, Issue , 2009, Pages 126-131

Effect of thermal annealing on deep and near-band edge emission from ZnO films grown by plasma-assisted MBE

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TEMPERATURES; EXCITON BOUND; EXPONENTIAL DEPENDENCE; FINE STRUCTURES; GREEN LUMINESCENCE; LINEAR DEPENDENCE; NEAR BAND EDGE EMISSIONS; OUT-DIFFUSION; PLASMA-ASSISTED MBE; SIMS PROFILE; TEMPERATURE-DEPENDENT PHOTOLUMINESCENCE; THERMAL-ANNEALING; ZNO FILMS; ZNO LAYERS;

EID: 77954308499     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (3)

References (11)
  • 8
    • 77954264632 scopus 로고    scopus 로고
    • note
    • Emission from the first 50 nm is suppressed since recombination of carriers in this region is mostly nonradiative due to high density of surface states and defects near the surface, while emission from depth exceeding 100 nm decreases exponentially due to exponentially decreasing penetration of laser light.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.