Technology options for 22nm and beyond

IWJT-2010: Extended Abstracts - 2010 International Workshop on Junction Technology

Volumn , Issue , 2010, Pages 7-12

  Kuhn, Kelin J ^a   Liu, Mark Y ^a   Kennel, Harold ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHANNEL MATERIALS; CMOS TRANSISTORS; ENGINEERING SOLUTIONS; EXOTIC MATERIALS; KEY PROCESS; MOBILITY ENHANCEMENT; NEW MATERIAL; PROCESS GENERATION; PROCESSING TECHNIQUE; SILICIDATION; TECHNOLOGY OPTIONS; TRANSISTOR ARCHITECTURE; ULTRATHIN BODY;

ARCHITECTURE;

EID: 77954300651     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IWJT.2010.5475000     Document Type: Conference Paper

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