Interference lithography: A powerful tool for fabricating periodic structures

Laser and Photonics Reviews

Volumn 4, Issue 4, 2010, Pages 568-580

  Lu, Cheng ^a,b   Lipson, R H ^a  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

^b UNIVERSITY OF TORONTO   (Canada)

Author keywords

Diffraction and scattering; Interference; Interferometry; Phase shifting; Photolithography; Photonic bandgap materials; Photoresists

Indexed keywords

BASIC PRINCIPLES; DATA STORAGE; DIFFRACTION AND SCATTERING; INTEGRATED CIRCUIT INDUSTRIES; INTERFERENCE LITHOGRAPHY; LIQUID IMMERSION LITHOGRAPHY; NON-COPLANAR; OPTICAL TELECOMMUNICATION; PHASE-SHIFTING; PHOTONIC BANDGAP MATERIALS; SHORTER WAVELENGTH; SUB-50 NM; SUBMICRON; TWO-DIMENSIONAL STRUCTURES; UNIT CELLS;

ENERGY GAP; INTERFEROMETRY; LIQUID LASERS; OPTICAL DATA STORAGE; PHASE SHIFT; PHOTOLITHOGRAPHY; PHOTONIC CRYSTALS; SPONTANEOUS EMISSION; SURFACE TREATMENT;

PERIODIC STRUCTURES;

EID: 77954266775     PISSN: 18638880     EISSN: 18638899     Source Type: Journal    
DOI: 10.1002/lpor.200810061     Document Type: Article

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