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Volumn 7726, Issue , 2010, Pages

Low cost, high performance far infrared microbolometer

Author keywords

3D integration; focal plane array; infrared; MEMS; microbolometer; SiGe

Indexed keywords

1/F NOISE; 3D INTEGRATION; CMOS COMPATIBLE; FAR INFRARED; FILL FACTOR; FIR SYSTEMS; HIGH THERMAL; LONG TERM; LOW COSTS; LOW TEMPERATURE WAFER BONDING; MANUFACTURING YIELD; MARKET PENETRATION; MICROBOLOMETER; MONOCRYSTALLINE SILICON; PIXEL SIZE; PROCESS INTEGRATION; READOUT INTEGRATED CIRCUITS; ROAD USERS; THERMISTOR MATERIALS; TIME TO MARKET; VACUUM SEALING; WAFER-SCALE PACKAGING;

EID: 77953752621     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.855784     Document Type: Conference Paper
Times cited : (9)

References (13)
  • 1
    • 45549102129 scopus 로고    scopus 로고
    • MEMS-based uncooled infrared bolometer arrays - A review
    • 68360D
    • Niklaus, F., Vieider, C., Jakobsen, H., "MEMS-based uncooled infrared bolometer arrays - a review", Proc. SPIE, Vol. 6836, 68360D 1-15 (2007).
    • (2007) Proc. SPIE , vol.6836 , pp. 1-15
    • Niklaus, F.1    Vieider, C.2    Jakobsen, H.3
  • 3
    • 45549109991 scopus 로고    scopus 로고
    • Latest amorphous silicon microbolometers developments at LETI-LIR
    • 69401W
    • Yon, J-J., Mottin, E., Tissot, J-L., "Latest amorphous silicon microbolometers developments at LETI-LIR", Proc. SPIE, Vol 6940, 69401W 1-8, (2008).
    • (2008) Proc. SPIE , vol.6940 , pp. 1-8
    • Yon, J.-J.1    Mottin, E.2    Tissot, J.-L.3
  • 7
    • 10044220961 scopus 로고    scopus 로고
    • Can the 300K radiating background noise limit be attained by uncooled thermal imagers?
    • Kruse, P. W., "Can the 300K radiating background noise limit be attained by uncooled thermal imagers?" Proc. SPIE, Vol. 5406, 437-446, (2004).
    • (2004) Proc. SPIE , vol.5406 , pp. 437-446
    • Kruse, P.W.1
  • 11
    • 24644521295 scopus 로고
    • Semiconductor joining by the solid-liquid-interdiffusion (SLID) process
    • Bernstein, L., "Semiconductor joining by the solid-liquid- interdiffusion (SLID) process", J. Electrochem. Soc., 113, 1282-1288 (1966).
    • (1966) J. Electrochem. Soc. , vol.113 , pp. 1282-1288
    • Bernstein, L.1
  • 13


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.