Formation, confirmation and application of Li: Al alloy as an electron injection layer with Li3N as the precursor

Journal of Physics D: Applied Physics

Volumn 43, Issue 25, 2010, Pages

  Xie, Kai ^a   Duan, Lian ^a   Zhang, Deqiang ^a   Qiao, Juan ^a   Dong, Guifang ^a   Wang, Liduo ^a   Qiu, Yong ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AL ALLOYS; CO-EVAPORATIONS; CONTROL DEVICE; ELECTRON INJECTION LAYERS; ELECTRON-INJECTION BARRIER; HIGHER EFFICIENCY; PHOTOVOLTAIC MEASUREMENTS;

ALLOYS; ALUMINUM; ELECTRON INJECTION; LIGHT EMITTING DIODES; ORGANIC LIGHT EMITTING DIODES (OLED); X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

LITHIUM ALLOYS;

EID: 77953608363     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/25/252001     Document Type: Article

References (16)

1. Tang C W and Vanslyke S A 1987 Appl. Phys. Lett. 51 913-15
2. Duggal A R 2002 IEEE/LEOS Annual Meeting Conf. Proc. (Glasgow, Scotland) vol 1 pp 247-8
3. Kido J, Nagai K and Okamoto Y 1993 IEEE Trans. Electron Devices 40 1342-4
4. Cao Y, Yu G, Parker I D and Heeger A J 2000 J. Appl. Phys. 88 3618-23
5. Haskal E I, Curioni A, Seidler P F and Andreoni W 1997 Appl. Phys. Lett. 71 1151-3
6. Lai S L, Chan M Y, Fung M K, Lee C S, Hung L S and Lee S T 2002 Chem. Phys. Lett. 366 128-33
7. Kim S Y, Kim W K, Kim K Y, Tak Y H and Lee J L 2006 Electrochem. Solid State Lett. 9 H1-3
8. Kim Y, Choi D, Moon B, Oh E, Lim H, Kwon S and Ha C S 2005 Adv. Eng. Mater. 7 1023-7
9. Im W B, Hwang H K, Lee J G, Han K and Kim Y 2001 Appl. Phys. Lett. 79 1387-9
10. Wakimoto T, Fukuda Y, Nagayama K, Yokoi A, Nakada H and Tsuchida M 1997 IEEE Trans. Electron Devices 44 1245-8
11. Kim Y, Jeong Y Y and Choi D K 2002 IEEE J. Quantum Electron. 38 1039-46
12. Duan L, Liu Q, Li Y, Gao Y D, Zhang G H, Zhang D Q, Wang L D O and Qiu Y 2009 J. Phys. Chem. C 113 13386-90
13. McAlister A J 1982 Bulletin of Alloy Phase Diagrams 3 177
14. Malliaras G G, Salem J R, Brock P J and Scott J C 1998 J. Appl. Phys. 84 1583-7
15. Hohlfeld A, Sunjic M and Horn K 1987 J. Vac. Sci. Technol. A 5 679-83
16. Oyamada T, Maeda C, Sasabe H and Adachi C 2003 Japan. J. Appl. Phys. 42 L1535-8