Random lasing in ballistic and diffusive regimes for macroporous silica-based systems with tunable scattering strength

Optics Express

Volumn 18, Issue 12, 2010, Pages 12153-12160

  Meng, Xiangeng ^a   Fujita, Koji ^a,b   Murai, Shunsuke ^a   Konishi, Junko ^a   Mano, Masafumi ^a   Tanaka, Katsuhisa ^a  

^a KYOTO UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BALLISTICS; EMISSION SPECTROSCOPY; LIGHT REFRACTION; REFRACTIVE INDEX; REFRACTOMETERS; SILICA; SOLVENTS;

CRITICAL VALUE; DIFFUSIVE REGIME; DYE SOLUTIONS; EMISSION SPECTRUMS; MACROPOROUS SILICA; MIXED SOLVENT; RANDOM LASERS; RANDOM LASING; SCATTERING REGIME; SCATTERING STRENGTH; SCATTERING SYSTEMS;

COHERENT SCATTERING;

EID: 77953604132     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.012153     Document Type: Article

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