Alternative resist processes for LWR reduction in EUVL

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7636, Issue , 2010, Pages

  Kaneyama, Koji ^a   Matsunaga, Kentaro ^a   Shiraishi, Gousuke ^a   Santillan, Julius Joseph ^a   Itani, Toshiro ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

Extreme ultraviolet lithography; resist process; rinse solution

Indexed keywords

EUV RESISTS; FINE PATTERN; HIGH SENSITIVITY; LINEWIDTH ROUGHNESS; REDUCTION EFFECTS; RESIST MATERIALS; RESIST PROCESS; RINSE SOLUTION;

EXTREME ULTRAVIOLET LITHOGRAPHY; LITHOGRAPHY;

ROUGHNESS MEASUREMENT;

EID: 77953444260     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846073     Document Type: Conference Paper

References (11)

1. K. Tawarayama, H. Aoyama, S. Magoshi, Y. Tanaka, S. Shirai, H. Tanaka, Proc. SPIE, 7271, 7271-44 (2009).
2. H. Oizumi, D. Kawamura, K. Kaneyama, S. Kobayashi, T. Itani, Proc. SPIE, 7273, 7273-111 (2009).
3. T. Itani, H. Oizumi, K. Kaneyama, D. Kawamura, S. Kobayashi, J. J. Santillan, J. Photopolym. Sci. Technol., 22, 1 (2009).
4. K. Matsunaga, presented at the 8th International EUV Symposium, Oct.19-21, 2009, Prague, Czech.
5. H. Xu, J. Blackwell, T. Yunkin, K. Min, Proc. SPIE, 7273, 7273-109 (2009).
6. E. Putna, T. Younkin, M. Chandhok, K. Frasure, Proc. SPIE, 7273, 7273-110 (2009).
7. K. Kaneyama, S. Kobayashi, Toshiro Itani, Proc. SPIE, 7273, 7273-115 (2009).
8. T. Itani, J. J. Santillan, J. Vac. Sci. Technol. B 27, 2986 (2009).
9. Y. Tanaka, H. Aoyama, S. Magoshi, K. Tawarayama, S. Shirai, H. Yanaka, Proc. SPIE, 7271, 7271-137 (2009).
10. H. Oizumi, D. Kawamura, K. Kaneyama, S. Kobayashi, T. Itani, Proc. SPIE, 7273, 7273-111 (2009).
11. S. Magoshi, S. Shirai, H. Mori, K. Tawarayama, Y. Tanaka, H. Tanaka, Proc. SPIE, 7273, 7273-116 (2009).