Chemical vapor deposition of silicon nanodots on TiO2 submicronic powders in vibrated fluidized bed

Materials Science and Engineering: B

Volumn 170, Issue 1-3, 2010, Pages 41-50

  Cadoret, L ^a   Rossignol, C ^b   Dexpert Ghys, J ^b   Caussat, B ^a  

^a UNIVERSITÉ DE TOULOUSE   (France)

^b CEMES CNRS   (France)

Author keywords

Chemical vapor deposition; Infra red spectroscopy; Raman spectroscopy; Silicon; Titanium dioxide; Transmission electron microscopy

Indexed keywords

AGGLOMERATION; CHEMICAL VAPOR DEPOSITION; DEPOSITION RATES; FLUIDIZATION; FLUIDIZED BEDS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; NANODOTS; POWDERS; RAMAN SPECTROSCOPY; SILICA; SILICON OXIDES;

AFTER-TREATMENT; CHEMICAL VAPOR DEPOSITION REACTORS; CHEMICAL VAPOUR DEPOSITION; DEPOSITION CONDITIONS; FLUIDIZED BED CHEMICAL VAPOR DEPOSITION; INFRA RED SPECTROSCOPY; OPERATING RANGES; SILICON NANODOTS; TIO 2 POWDERS; VIBRATED FLUIDIZED BEDS;

TITANIUM DIOXIDE;

EID: 77953323296     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2010.02.024     Document Type: Article

References (27)

1. Maeda M., and Watanabe T. Surf. Coatings Technol. 201 (2007) 9309-9313 (and references therein)
2. Scheffe J.R., Frances A., King D.M., Liang X., Branch B.A., Cavanagh A.S., George S.M., and Weimer A.W. Thin Solid Films 517 (2009) 1874-1879
3. Nauman d'Alnoncourt R., Becker M., Sekulic J., Fisher R.A., and Muhler M. Surf. Coatings Technol. 201 (2007) 9035-9039
4. Czok G.S., and Werther J. Powder Technol. 162 (2006) 100-110
5. Chaliampalas D., Vourlias G., Pistofidis N., Pavlidou E., Stergiou A., Stergioudis G., Polychroniadis E.K., and Tsipas D. Mater. Lett. 61 (2007) 223-226
6. Perez-Mariano J., Lau K.H., Alvarez E., Malhotra R., and Hornbostel M. Mater. Chem. Phys. 112 (2008) 180
7. Geldart D. Powder Technol. 7 (1973) 285-292
8. Dutta A., and Dullea L.V. AIChE. Symp. Ser. 87 281 (1991) 38-46
9. Zhou T., and Li H. Powder Technol. 102 (1999) 215-220
10. Kim J., and Han G.Y. Powder Technol. 166 (2006) 113-122
11. Wank J.R., George S.M., and Weimer A.W. Powder Technol. 121 (2001) 195-204
12. Alavi S., and Caussat B. Powder Technol. 157 (2005) 114-120
13. Xu C., and Zhu J. Powder Technol. 161 (2006) 135-144 (and references therein)
14. Morooka S., Kusakabe K., and Kobata A. In: Grace G.R., Shemilt L.W., and Bergougnou M.A. (Eds). Fluidization VI (1989), AIChE, New York 359
15. Li C., and Hua B. Thin Solid Films 310 (1997) 238-243
16. Hakim L.F., George S.M., and Weimer A.W. Nanotechnology 16 (2005) 2375-2381
17. King D.M., Spencer II J.A., Liang X., Hakim L.F., and Weimer A.W. Surf. Coatings Technol. 210 (2007) 9163-9171
18. Cadoret L., Reuge N., Pannala S., Syamlal M., Rossignol C., Dexpert-Ghys J., Coufort C., and Caussat B. Surf. Coatings Technol. 201 (2007) 8919-8923
19. Kunii D., and Levenspiel O. Fluidization Engineering. 2nd ed. (1991), J. Wiley and Sons, New York
20. L. Cadoret, PhD thesis, INP Toulouse, France, 2007.
21. Zwick A., and Carles R. Phys. Rev. B 48 9 (1993) 6024-6032
22. Mahon D.C., Mahon P.J., and Creagh D.C. Nucl. Instrum. Methods Phys. Res. A580 (2007) 430-433
23. Zhang S., Liao X., Raniero L., Fortunato E., Xu Y., Kong G., Aguas H., Ferreira I., and Martins R. Solar Energy Mater. Solar Cells 90 (2006) 3001-3008
24. Beattie I.R., and Gilson T.R. Proc. Royal Soc. London A307 (1968) 407-429
25. Ohsaka T., Yamaoka S., and Shimomura O. Solid State Commun. 30 (1979) 345-347
26. Balachadran U., and Eror N.G. J. Solid State Chem. 42 3 (1982) 276-282
27. Parker J.C., and Siegel R.W. Appl. Phys. Lett. 57 9 (1990) 943-945