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Nano Letters

Volumn 10, Issue 6, 2010, Pages 2197-2201

Vacuum-free self-powered parallel electron lithography with sub-35-nm resolution

(2) Lu, Yuerui a Lal, Amit a

a Cornell University (United States)

Author keywords

High throughput; Nanolithography; Nanowire array; Parallel; Vacuum free

Indexed keywords

ACHILLES HEEL; ARRAY FABRICATION; CRITICAL DIMENSION; E-BEAM RESIST; ELECTRON PROJECTION LITHOGRAPHY; EXPOSURE-TIME; HIGH-THROUGHPUT; IN-VACUUM; LITHOGRAPHY RESOLUTION; LOW COSTS; MASK FABRICATION; MEMBRANE MASKS; MONTE CARLO SIMULATION; NANO-DEVICES; NANOWIRE ARRAYS; NM RESOLUTION; SELF-POWERED; STENCIL MASKS; TOPDOWN; TRITIDES; VACUUM-FREE;

BERYLLIUM; COMPUTER SIMULATION; ELECTRON BEAM LITHOGRAPHY; ELECTRONS; FABRICATION; MASKS; MONTE CARLO METHODS; NANOLITHOGRAPHY; NANOWIRES; PHOTOLITHOGRAPHY; POSITION CONTROL; THIN FILMS; THROUGHPUT; VACUUM TECHNOLOGY;

VACUUM;

EID: 77953301003 PISSN: 15306984 EISSN: 15306992 Source Type: Journal
DOI: 10.1021/nl101055h Document Type: Article

Times cited : (21)

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