Atomic layer deposition for industrial optical coatings

Chinese Optics Letters

Volumn 8, Issue SUPPL., 2010, Pages 53-58

  Maula, Jarmo ^a  

^a Beneq Oy   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

CONFORMALITY; EMERGING APPLICATIONS; NANOMETER-THICK FILMS; NEW MATERIAL; OPTICAL FIELD;

OPTICAL COATINGS; PHYSICAL VAPOR DEPOSITION; THICK FILMS;

ATOMIC LAYER DEPOSITION;

EID: 77953252728     PISSN: 16717694     EISSN: None     Source Type: Journal    
DOI: 10.3788/COL201008S1.0053     Document Type: Article

References (11)

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