CdS films deposited by chemical bath under rotation

Applied Surface Science

Volumn 256, Issue 20, 2010, Pages 6090-6095

  Oliva Aviles A I ^a   Patino R ^a   Oliva, A I ^a  

^a DEPARTAMENTO DE FÍSICA APLICADA   (Mexico)

Author keywords

CdS films; CdS properties; Chemical bath deposition; Rotating substrate

Indexed keywords

CADMIUM CHLORIDE; CADMIUM TELLURIDE; CHLORINE COMPOUNDS; DEPOSITION RATES; ENERGY GAP; II-VI SEMICONDUCTORS; POTASSIUM HYDROXIDE; ROTATION; SUBSTRATES; SULFUR COMPOUNDS; SURFACE ROUGHNESS;

CDS FILMS; CHEMICAL DEPOSITION; CHEMICAL REAGENTS; CHEMICAL-BATH DEPOSITION; CRITICAL EFFECTS; INDUSTRIAL PRODUCTION; ROTATING SUBSTRATES; ROTATION VELOCITY;

CADMIUM SULFIDE;

EID: 77953133462     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.03.125     Document Type: Article

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