Preparation and atomic oxygen erosion resistance of silica film formed on silicon rubber by sol-gel method

Applied Surface Science

Volumn 256, Issue 20, 2010, Pages 6133-6138

  Xing, An ^a   Gao, Yuan ^a   Yin, Jungang ^a   Ren, Guangjuan ^a   Liu, Huitao ^a   Ma, Mianjun ^b  

^a YANTAI UNIVERSITY   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

Atomic oxygen; Silica film; Silicon coupling agent; Silicon rubber

Indexed keywords

ATOMS; COUPLING AGENTS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INTERFACES (MATERIALS); MOLECULAR OXYGEN; ORGANIC POLYMERS; RUBBER; RUBBER FILMS; SILICA; SILICON; SOL-GEL PROCESS; SOL-GELS; THIN FILMS;

ATOMIC OXYGEN; ATOMIC OXYGEN IRRADIATION; FOURIER TRANSFORMED INFRARED SPECTROSCOPY; MORPHOLOGY AND STRUCTURES; SCANNING ELECTRONIC MICROSCOPES; SILICA FILM; SILICON COUPLING AGENT; SILICON RUBBERS;

FILM PREPARATION;

EID: 77953132295     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.03.133     Document Type: Article

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