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Volumn 93, Issue 6, 2010, Pages 1554-1556
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Bismuth borosilicate-based thick film passivation of Ag grid for large-area dye-sensitized solar cells
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL INERTNESS;
COATED SUBSTRATES;
CORROSIVE REACTIONS;
DEGREE OF DENSIFICATION;
DYE-SENSITIZED SOLAR CELL;
DYE-SENSITIZED SOLAR CELLS;
ELECTRICAL RESISTANCES;
EXPOSURE PERIOD;
FIRING TEMPERATURE;
FLUORINE DOPED TIN OXIDE;
GLASS FILMS;
GLASS PASTE;
GLASS TRANSITION TEMPERATURE;
OPTICAL TRANSMITTANCE;
PASSIVATION FILM;
PASSIVATION LAYER;
SCREEN-PRINTED;
TEMPERATURE RANGE;
BISMUTH;
ELECTROLYTES;
FLUORINE;
GLASS TRANSITION;
PASSIVATION;
PHOTOELECTROCHEMICAL CELLS;
SILVER;
SOLAR CELLS;
THICK FILMS;
TIN;
TITANIUM COMPOUNDS;
BOROSILICATE GLASS;
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EID: 77953092405
PISSN: 00027820
EISSN: 15512916
Source Type: Journal
DOI: 10.1111/j.1551-2916.2009.03577.x Document Type: Article |
Times cited : (11)
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References (9)
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