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Volumn , Issue , 2005, Pages 73-86

Three-dimensional nanofabrication using focused ion beams

Author keywords

3D CAD data; 3D nanofabrication; Carbon deposition; FIB CVD

Indexed keywords


EID: 77952920555     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1007/0-387-23313-X_4     Document Type: Chapter
Times cited : (4)

References (8)
  • 2
    • 84892302037 scopus 로고
    • Property of tungsten film fabricated by focused ion beam chemical vapor deposition
    • Spring
    • Kaito T and Adachi T, "Property of Tungsten Film fabricated by Focused Ion Beam Chemical Vapor Deposition", Proc. of Japan Society of Applied Physics 4a-2-9,339 (1986 Spring).
    • (1986) Proc. of Japan Society of Applied Physics 4a-2-9 , vol.339
    • Kaito, T.1    Adachi, T.2
  • 4
    • 84892335169 scopus 로고
    • Circuit modification and failure analysis on IC Chip using focused ion beam chemical vapor deposition and milling
    • Autumn
    • Kaito T,Adachi T, and Kobayashi K,"Circuit Modification and Failure Analysis on IC Chip using Focused Ion Beam Chemical Vapor Deposition and Milling", Proc. of Japan Society of Applied Physics 28a-ZG-10,348 (1986 Autumn).
    • (1986) Proc. of Japan Society of Applied Physics 28a-ZG-10 , vol.348
    • Kaito Tadachi, T.1    Kobayashi, K.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.