Tailoring spin relaxation in thin films by tuning extrinsic relaxation channels

IEEE Transactions on Magnetics

Volumn 46, Issue 6, 2010, Pages 2252-2255

  Barsukov, Igor ^a   Meckenstock, Ralf ^a   Lindner, Jrgen ^a   Moller, Marc ^a   Hassel, Christoph ^a   Posth, Oliver ^a   Farle, Michael ^a   Wende, Heiko ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

Magnetic resonance; Relaxation processes; Thin films

Indexed keywords

DAMPING; FERROMAGNETIC MATERIALS; FERROMAGNETISM; MAGNETIC RESONANCE; RELAXATION PROCESSES; SILICON; SURFACE DEFECTS;

ANISOTROPIC BEHAVIORS; FERROMAGNETIC THIN FILMS; GILBERT DAMPING; MAGNON-MAGNON SCATTERING; RELAXATION CHANNELS; RELAXATION RATES; SPIN RELAXATION; SPIN RELAXATION PROCESS;

THIN FILMS;

EID: 77952792899     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2010.2044482     Document Type: Article

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