Surface microfluidics fabricated by superhydrophobic nanocomposite photoresist

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2010, Pages 420-423

  Hong, Lingfei ^a,b   Pan, Tingrui ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b BEIHANG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ENERGY; EMERGING APPLICATIONS; HIGH-THROUGHPUT; LITHOGRAPHIC RESOLUTION; MATRIX; MICRO FLUIDIC SYSTEM; MICROFABRICATED; MICROFLUIDIC NETWORKS; MICROFLUIDIC PUMPS; NANOCOMPOSITE MATERIALS; PHOTOLITHOGRAPHIC PROCESS; PHOTOPATTERNABILITY; SINGLE-STEP; SUBSTRATE ADHESION; SUPERHYDROPHOBIC; SUPERHYDROPHOBICITY; SURFACE TENSION FORCE;

CHEMICAL DETECTION; CONTACT ANGLE; HYDROPHOBICITY; LIGHT SENSITIVE MATERIALS; MECHANICAL ENGINEERING; MECHANICS; NANOCOMPOSITES; NANOPARTICLES; PHOTOLITHOGRAPHY; PHOTOSENSITIVITY; REACTIVE ION ETCHING; REUSABILITY; SURFACE TENSION; SURFACES;

MICROFLUIDICS;

EID: 77952778750     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MEMSYS.2010.5442477     Document Type: Conference Paper

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