Fabrication of EuTiO3 epitaxial thin films by pulsed laser deposition

Japanese Journal of Applied Physics

Volumn 48, Issue 10 Part 1, 2009, Pages 1002081-1002083

  Hatabayashi, Kunitada ^a   Hitosugi, Taro ^b,c   Hirose, Yasushi ^a,c   Cheng, Xianqiang ^a   Shimada, Toshihiro ^a,c   Hasegawa, Tetsuya ^a,c  

^a UNIVERSITY OF TOKYO   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIFERROMAGNETIC ORDERINGS; ATOMICALLY FLAT SURFACE; BAND CALCULATION; CELL VOLUME; EPITAXIAL THIN FILMS; FERROMAGNETIC STATE; FIRST-PRINCIPLES; HIGH QUALITY; IN-SITU; INTENSITY OSCILLATIONS; LAYER-BY-LAYER GROWTH; SRTIO; STEP-TERRACE STRUCTURE;

ANTIFERROMAGNETISM; DEPOSITION; LANTHANUM COMPOUNDS; MAGNETIC FIELDS; MAGNETIC PROPERTIES; NEON; PULSED LASER DEPOSITION; PULSED LASERS; SOIL CONSERVATION; TEMPERATURE MEASUREMENT;

EPITAXIAL FILMS;

EID: 77952732015     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.48.100208     Document Type: Article

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