Electromechanical properties of BaTiO3 ceramics prepared by spark plasma sintering and other methods

Japanese Journal of Applied Physics

Volumn 48, Issue 9 Part 2, 2009, Pages

  Maiwa, Hiroshi ^a  

^a SHONAN INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIRESONANT FREQUENCY; CONVENTIONAL SINTERING; ELECTROMECHANICAL PROPERTY; FIELD-INDUCED DISPLACEMENT; FIELD-INDUCED STRAIN; GRAIN SIZE; HIGH PERMITTIVITY; INTERNAL STRESS; LOSS TANGENT; PIEZOELECTRIC CONSTANT; TWO-STEP SINTERING;

ELECTRIC SPARKS; SPARK PLASMA SINTERING;

CERAMIC MATERIALS;

EID: 77952731115     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.48.09KD04     Document Type: Article

References (9)

1. H. Takahashi, Y. Numamoto, J. Tani, and S. Tsurekawa: Jpn. J. Appl. Phys. 45 (2006) 7405.
2. H. Takahashi, Y. Numamoto, J. Tani, and S. Tsurekawa: Jpn. J. Appl. Phys. 47 (2008) 8468.
3. T. Karaki, K. Yan, T. Miyamoto, and M. Adachi: Jpn. J. Appl. Phys. 46 (2007) L97.
4. T. Takeuchi, Y. Suyama, D. C. Sinclair, and H. Kageyama: J. Mater. Sci. 36 (2001) 2329.
5. Z. A. Munir, U. Anselmi-Tambururini, and M. Ohyanagi: J. Mater. Sci. 41 (2006) 763.
6. H. Maiwa: Jpn. J. Appl. Phys. 46 (2007) 7013.
7. H. Maiwa: Jpn. J. Appl. Phys. 47 (2008) 7646.
8. K. Kinoshita and A. Yamaji: J. Appl. Phys. 47 (1976) 371.
9. G. Arlt, D. Hennings, and G. de With: J. Appl. Phys. 58 (1985) 1619.