Phonon echoes in Si:P at very low temperature

Journal of Physics: Conference Series

Volumn 150, Issue 4, 2009, Pages

  Jeong, M ^a   Song, M ^a   Ueno, T ^b   Mizusaki, T ^c,d   Matsubara, A ^d   Lee, S ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b KYOTO UNIVERSITY   (Japan)

^c TOYOTA PHYSICAL AND CHEMICAL RESEARCH INSTITUTE   (Japan)

^d KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); INSULATION; PHONONS; POWDERS; SEMICONDUCTOR DOPING; SUPERFLUID HELIUM; TEMPERATURE; TIME DELAY;

DOPANT CONCENTRATIONS; ECHO INTENSITY; EXTERNAL MAGNETIC FIELD; HELIUM MIXTURES; METALLIC SAMPLES; PIEZOELECTRIC POWDERS; RADIO FREQUENCY PULSE; VERY LOW TEMPERATURES;

SILICON;

EID: 77952499081     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/150/4/042078     Document Type: Conference Paper

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