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Volumn 48, Issue 4 PART 2, 2009, Pages
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Microstructure control of low-loss Ni-Zn ferrite by low-temperature sputtering for on-chip magnetic film
a
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Author keywords
[No Author keywords available]
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Indexed keywords
ADVANCED LSI;
BARRIER PROPERTIES;
CU/LOW-K INTERCONNECTS;
FERRITE FILMS;
FILM MICROSTRUCTURES;
GAS RATIO;
HIGH EFFICIENCY;
HIGH RESISTIVITY;
HIGH-SATURATION MAGNETIZATION;
KEY FACTORS;
LOW LOSS;
LOW TEMPERATURES;
MAGNETIC AND ELECTRICAL PROPERTIES;
MICROSTRUCTURE CONTROL;
NI-ZN FERRITES;
ON CHIPS;
ONCHIP INDUCTORS;
OXYGEN ADDITION;
RF-MAGNETRON SPUTTERING;
SPUTTERING CHAMBER;
SPUTTERING GAS;
BUFFER LAYERS;
ELECTRIC INDUCTORS;
ELECTRIC PROPERTIES;
FERRITE;
MAGNETIC DEVICES;
MAGNETIC FILMS;
MAGNETISM;
MAGNETOELECTRIC EFFECTS;
MAGNETRON SPUTTERING;
METALLIC FILMS;
MICROSTRUCTURE;
OXYGEN;
SATURATION MAGNETIZATION;
TANNING;
TANTALUM COMPOUNDS;
ZINC;
GAS PERMEABLE MEMBRANES;
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EID: 77952481122
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.48.04C030 Document Type: Article |
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Times cited : (6)
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References (16)
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