Chemorheology of sol-gel silica for the patterning of high aspect ratio structures by nanoimprint

Chemistry of Materials

Volumn 22, Issue 10, 2010, Pages 3143-3151

  Letailleur, Alban ^a   Teisseire, Jérémie ^a   Chemin, Nicolas ^a   Barthel, Etienne ^a   Søndergård, Elin ^a  

^a SAINT GOBAIN RECHERCHE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MICROSTRUCTURE; CHEMORHEOLOGY; EXISTING METHOD; GEL FILMS; HIGH ASPECT RATIO STRUCTURES; HYBRIDS MATERIAL; ISOTHERMAL TREATMENT; METHYLTRIETHOXYSILANE; NANO-IMPRINT; RHEOLOGICAL PROPERTY; SCRATCH TEST; SOL-GEL MATERIALS; SOL-GEL SILICA; SUBMICROMETER SCALE; SURFACE PATTERNING; THERMAL CURING; TIME TEMPERATURE TRANSFORMATION; TUNABLE PROPERTIES;

ASPECT RATIO; DYNAMIC ANALYSIS; DYNAMIC MECHANICAL ANALYSIS; INFRARED SPECTROSCOPY; MICROSTRUCTURE; NANOIMPRINT LITHOGRAPHY; RHEOLOGY; SILICA; SOL-GEL PROCESS; SOL-GELS; SOLS; THERMOSETS;

GELS;

EID: 77952471391     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm100285b     Document Type: Article

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