Design and process co-optimization for 28nm/22nm and beyond - A foundry's perspective

Technical Digest - International Electron Devices Meeting, IEDM

Volumn , Issue , 2009, Pages

  Hou, Cliff ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED PROCESS; CO-OPTIMIZATION; COLLABORATION MODELS;

ELECTRON DEVICES; FOUNDRY PRACTICE;

DESIGN;

EID: 77952404226     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IEDM.2009.5424324     Document Type: Conference Paper

References (0)