Impurity and tracer diffusion studies in magnesium and its alloys

Magnesium Technology

Volumn , Issue , 2010, Pages 537-538

  Brennan, Sarah ^a   Warren, Andrew P ^a   Coffey, Kevin R ^a   Sohn, Yongho ^a   Kulkarni, Nagraj ^b   Todd, Peter ^b  

^a University of Central Florida   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

Diffusion; Magnesium; Secondary ion mass spectroscopy

Indexed keywords

AL FILMS; COMPUTATIONAL MATERIALS; CONCENTRATION PROFILES; DC MAGNETRON SPUTTERING; DIFFUSION PROFILES; IMPURITY DIFFUSION; IN-SITU; MAGNESIUM AND ITS ALLOYS; MG ALLOY; POLYCRYSTALLINE; PROCESSING ROUTE; PURE AL; QUARTZ CAPSULES; RF PLASMA; SECONDARY ION MASS SPECTROSCOPY; SINGLE PHASE; TRACER DIFFUSION;

ALLOYS; ALUMINUM; CERIUM ALLOYS; DEPTH PROFILING; DIFFUSION IN SOLIDS; FUNCTIONAL ELECTRIC STIMULATION; IONS; ISOTOPES; MASS SPECTROMETERS; OXIDE MINERALS; QUARTZ; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY;

MAGNESIUM;

EID: 77952393079     PISSN: 15454150     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

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