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Materials Research Society Symposium Proceedings

Volumn 1165, Issue , 2010, Pages 209-214

Hydrogen diffusion in zinc oxide thin films

(7) Beyer, W a,b Breuer, U a Hamelmann, F b Hupkes J a Stark A a Stiebig, H b Zastrow, U a

a FORSCHUNGSZENTRUM JÜLICH (Germany)

b Malibu GmbH and Co KG (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC HYDROGEN; COMPACT STRUCTURES; H DIFFUSION; HYDROGEN DIFFUSION; LONG-RANGE DIFFUSION; LOW PRESSURE CHEMICAL VAPOUR DEPOSITIONS; MOLECULAR HYDROGEN; RARE GAS; VOID STRUCTURES; ZINC OXIDE THIN FILMS; ZNO FILMS;

AMORPHOUS SILICON; CRYSTAL ATOMIC STRUCTURE; DEUTERIUM; HYDROGEN; INERT GASES; MICROCRYSTALLINE SILICON; NEON; OXIDE FILMS; SECONDARY ION MASS SPECTROMETRY; THIN FILMS; ZINC; ZINC OXIDE;

DIFFUSION;

EID: 77952060560 PISSN: 02729172 EISSN: None Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper

Times cited : (9)

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